Liquid jet and recovery system for immersion lithography,申请号US11808850-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Liquid jet and recovery system for immersion lithography
摘要
申请公布号	US7821615(B2)	申请公布日期	2010.10.26
申请号	US11808850	申请日期	2007.06.13
申请人		发明人
分类号	G03B0027/000052;G03B0027/000032;G03B0027/000042;G03B0027/000058;G03C0005/000000	主分类号	G03B0027/000052
代理机构		代理人
主权项
地址

您可能感兴趣的专利

POLYMERIC COMPOSITION

CONTINUOUS COLD ROLLING MILL

POLYHALOGENEREDE UMAETTEDE MONOMERESTERE

FREMGANGSMAADE TIL EKSTRUSION

CHARGE MATERIAL PORTION FLOW DIVIDER

POWER TRANSMITTING DEVICE

PHASE RADIOTECHNICAL SYSTEM RECEIVING INDICATOR

INTERFERENCE SUPPRESSOR IN RECEIVING FREQUENCY-MODULATED SIGNALS

METHOD OF PREPARING TETRONIC ACID

SEALED PASSAGE IN WALL FOR PIPELINE

METHOD OF SHAPING DIGITAL TELEVISION SIGNAL

FACSIMILE APPARATUS CARRIAGE DRIVE

SPARK-PROOF TELEPHONE SET

TELEGRAPHY APPARATUS TRANSMITTING DEVICE

METHOD OF EVALUATING NOISE PROOFNESS BETWEEN SYMMETRICAL COMMUNICATION CABLE COUPLES

MESSAGE DURATION DISCRIMINATOR

ANALOGUE-DIGITAL CONVERTER

PULSE DELAY DEVICE

TRANSISTORIZED REJECTION FILTER

QUICK-OPENABLE COVER FOR HOUSINGS OF EXPLOSION-PROOF ELECTRIC EQUIPMENT