发明名称 Sputter ion pump
摘要 A sputter ion pump includes one vacuum chamber, two parallel anode poles and one cold cathode electron emitter. The vacuum chamber includes at least one aperture located in an outer wall thereof. The two parallel anode poles are positioned in the vacuum chamber and arranged in a symmetrical configuration about a center axis of the vacuum chamber. The cold cathode electron emission device is located on or proximate the outer wall of the vacuum chamber and faces a corresponding aperture. The cold cathode electron emission device is thus configured for injecting electrons through the corresponding aperture and into the vacuum chamber. The sputter ion pump produces a saddle-shaped electrostatic field and is free of a magnetic field. The sputter ion pump has a simplified structure and a low power consumption.
申请公布号 US7819633(B2) 申请公布日期 2010.10.26
申请号 US20060478421 申请日期 2006.06.28
申请人 TSINGHUA UNIVERSITY;HON HAI PRECISION INDUSTRY CO., LTD. 发明人 QIAN LI;TANG JIE;LIU LIANG;QI JING;CHEN PI-JIN;HU ZHAO-FU;FAN SHOU-SHAN
分类号 F04B37/02 主分类号 F04B37/02
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