发明名称 Methods for growing semiconductors and devices thereof from the alloy semiconductor GaInNAs
摘要 A method is disclosed for growing a nitrogen-containing Ill-V alloy semiconductor on a semiconductor substrate such as GaAs, which is formed by MOCVD method using nitrogen containing organic compounds having relatively low dissociation temperatures. The alloy semiconductor has a high nitrogen content which exceeds the contents previously achieved, and has a high photoluminescence intensity. There are also disclosed fabrications of semiconductor devices comprising the alloy semiconductors, such as heterostructure and homo-junction light emitting devices.
申请公布号 USRE41890(E1) 申请公布日期 2010.10.26
申请号 US20030603418 申请日期 2003.06.24
申请人 RICOH COMPANY, LTD. 发明人 SATO SHUNICHI
分类号 H01L21/30;C30B25/02;H01L21/205;H01L33/06;H01L33/32;H01S5/00 主分类号 H01L21/30
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