发明名称 |
In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction |
摘要 |
An apparatus and process for in-situ measurement of thin film thickness, ash rate, and end point generally include generating and measuring shallow angle interference patterns. The apparatus generally includes a chamber having a first viewing port and a second viewing port. The first viewing port includes receiving optics configured to receive light at a shallow angle from a surface of a substrate processed therein. The second port includes a broadband illumination source and is preferably disposed in a sidewall opposite the receiving optics. The process includes calculating the thin film thickness, ash rate, and end point from the interference patterns.
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申请公布号 |
US7821655(B2) |
申请公布日期 |
2010.10.26 |
申请号 |
US20050053731 |
申请日期 |
2005.02.08 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
JANOS ALAN;SAUBHAYANA MONTIEN |
分类号 |
G01B11/06;G01B11/28;H01L21/3065 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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