发明名称 Techniques for forming interconnects
摘要 A method for forming interconnects onto attachment points of a wafer includes the steps of providing a mold with a plurality of cavities having a predetermined shape, depositing a release agent on surfaces of the cavities, filling the cavities with an interconnect material to form the interconnects, removing the release agent from the mold, and attaching the interconnects to the attachment points of the wafer. An adhesive layer can optionally be deposited in addition to the release layer. The adhesive layer can be used, for example, to bond the chip to a package.
申请公布号 US7819376(B2) 申请公布日期 2010.10.26
申请号 US20070930269 申请日期 2007.10.31
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DANOVITCH DAVID H.;FAROOQ MUKTA G.;GRUBER PETER A.;KNICKERBOCKER JOHN U.;PROTO GEORGE R.;SHIH DA-YUAN
分类号 H01L21/44 主分类号 H01L21/44
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