发明名称 |
Deposition method and apparatus |
摘要 |
A deposition method and apparatus provide a uniform deposition rate and good reproducibility in a process used to deposit a material onto a substrate. The deposition method includes preparing a substrate on which a thin film is deposited, preparing a line source that includes a plurality of heating crucibles are disposed in line, and rotating the line source while depositing the deposition material on the substrate.
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申请公布号 |
US7819975(B2) |
申请公布日期 |
2010.10.26 |
申请号 |
US20050266398 |
申请日期 |
2005.11.04 |
申请人 |
SAMSUNG MOBILE DISPLAY CO., LTD. |
发明人 |
RYU SEOUNG-YOON |
分类号 |
C23C16/00;H01L21/31;H01L21/469 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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