发明名称 Method for collecting optical proximity correction parameter
摘要 This invention relates to a method for collecting an Optical Proximity Correction parameter, which includes: performing an Optical Proximity Correction for a test line containing a non-right turning-angle to generate a to-be-exposed pattern having an assistant line; obtaining, by way of simulation or actual exposure, a formed line generated from the to-be-exposed pattern being exposed; and comparing the formed line with the test line to determine a difference there between so as to determine whether there is a redundant part and/or a missing part in the assistant line at location of the turning-angle of the test line. Being compared with the prior art, this invention sets the non-right turning-angle in the to-be-exposed test line. By comparing the formed line (which is generated by simulation or actual exposure) of the above test line with the test line itself, the redundant part and/or the missing part of the assistant line, as well as proximity data such as the position of the redundant part and/or the missing part and the like, can be obtained. Then, these proximity data can be used to correct and perfect the OPC model having a line containing a non-right turning-angle.
申请公布号 US7820346(B2) 申请公布日期 2010.10.26
申请号 US20090573753 申请日期 2009.10.05
申请人 SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 WANG JINHENG
分类号 G03F9/00;G06F17/50;G06K9/00 主分类号 G03F9/00
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