发明名称 Nonvolatile semiconductor memory and method for manufacturing the same
摘要 According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory including: a columnar semiconductor; a charge storage insulating film including: a first insulating film formed around the columnar semiconductor, a charge storage film formed around the first insulating film, and a second insulating film formed around the charge storage film; an electrode extending two-dimensionally to surround the charge storage insulating film, the electrode having a groove; and a metal silicide formed on a sidewall of the groove.
申请公布号 US7821058(B2) 申请公布日期 2010.10.26
申请号 US20080970992 申请日期 2008.01.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KIDOH MASARU;KATSUMATA RYOTA;KITO MASARU;FUKUZUMI YOSHIAKI;AOCHI HIDEAKI;TANAKA HIROYASU;MATSUOKA YASUYUKI;OZAWA YOSHIO;SATO MITSURU
分类号 H01L27/115;H01L21/8247;H01L29/792 主分类号 H01L27/115
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