| 发明名称 |
Method and apparatus for wafer cleaning |
| 摘要 |
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.
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| 申请公布号 |
US7819985(B2) |
申请公布日期 |
2010.10.26 |
| 申请号 |
US20060497193 |
申请日期 |
2006.07.31 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
VERHAVERBEKE STEVEN;TRUMAN J. KELLY;KO ALEXANDER;ENDO RICK R. |
| 分类号 |
B08B7/00;H01L21/304;B08B3/00;B08B3/02;B08B3/12;B08B7/04;H01L21/00 |
主分类号 |
B08B7/00 |
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