APPARATUS AND METHOD FOR PLASMA ION DOPING

摘要

PURPOSE: An apparatus and a method for plasma ion doping are provided to stably perform a doping process inside a process chamber by including an electronic induction member. CONSTITUTION: An apparatus and a method for plasma ion doping include a processing chamber(10), a source, a platen(12), an injection pulse source, and an electromagnetic induction member. The source generates the plasma within the processing chamber. The platen supports the substrate within the processing chamber. The injection pulse source accelerates the ions within the plasma to the substrate. An electromagnetic induction member induces electrons.