| 摘要 |
<p>PURPOSE: An exhaust apparatus and a substrate treatment apparatus including the same are provided to prevent a first exhaust line from being damaged by chemical, by cooling fume heated to a high temperature in a gas state by installing a cooling pipe in the first exhaust line. CONSTITUTION: A first exhaust line(410) discharges fume(F) generated in treating a substrate(G). A cooling pipe(420) circulates cooling water to cool the fume. A second exhaust line(430) discharges liquid condensed when the fume is cooled. The cooling pipe has a structure of surrounding the exterior of the first exhaust line in a coil type. A processing chamber(100) provides space to treat the substrate. A transport unit(200) is installed inside the processing chamber, and transports the substrate.</p> |
