| 摘要 |
PURPOSE: Plasma surface treating apparatus and method are provided to enhance the processing speed and to process the surface uniformly and stably regardless of the size and the shape since the surface is processed using the ion accelerated by the minus high-voltage pulse. CONSTITUTION: A plasma surface treating apparatus is composed of a connecting unit, a pulse voltage generator(150), a magnetic core(170), and a vacuum chamber(110). An interface unit is electrically connected to a process-required part of a target. The pulse voltage generator is electrically connected to the interface unit. The magnetic core is arranged around the boundary of the process-required part of the target. The magnetic core blocks the current flowing through the process-required part of the target by the pulse voltage from flowing out of the boundary of the process-required part of the target. The target is held in a vacuum chamber.
|
