发明名称 |
PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND METHOD FOR USING THE APPARATUS |
摘要 |
Provided is a holding stage structure which holds a substrate and disposed in a process chamber that is vacuum-evacuatable and allows a predetermined process to be performed on the substrate therein. The holding stage structure includes: a holding stage body on which the substrate is placed; an elevation pin mechanism lowering the substrate on the holding stage body or raising the substrate from the holding stage body; and a stepped portion formed on the holding stage body so that a peripheral portion of a rear surface of the substrate placed on the holding stage body is exposed to a processing gas supplied into the process chamber.
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申请公布号 |
US2010264115(A1) |
申请公布日期 |
2010.10.21 |
申请号 |
US20080526460 |
申请日期 |
2008.02.04 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KAWAMURA KOHEI;KOBAYASHI YASUO;NOZAWA TOSHIHISA;ISHIBASHI KIYOTAKA |
分类号 |
B23Q1/00;C23C16/513;H01L21/3065;H05H1/24 |
主分类号 |
B23Q1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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