发明名称 PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND METHOD FOR USING THE APPARATUS
摘要 Provided is a holding stage structure which holds a substrate and disposed in a process chamber that is vacuum-evacuatable and allows a predetermined process to be performed on the substrate therein. The holding stage structure includes: a holding stage body on which the substrate is placed; an elevation pin mechanism lowering the substrate on the holding stage body or raising the substrate from the holding stage body; and a stepped portion formed on the holding stage body so that a peripheral portion of a rear surface of the substrate placed on the holding stage body is exposed to a processing gas supplied into the process chamber.
申请公布号 US2010264115(A1) 申请公布日期 2010.10.21
申请号 US20080526460 申请日期 2008.02.04
申请人 TOKYO ELECTRON LIMITED 发明人 KAWAMURA KOHEI;KOBAYASHI YASUO;NOZAWA TOSHIHISA;ISHIBASHI KIYOTAKA
分类号 B23Q1/00;C23C16/513;H01L21/3065;H05H1/24 主分类号 B23Q1/00
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