发明名称 MATERIAL HAVING A LOW DIELECTRIC KONSTANT AND METHOD OF MAKING THE SAME
摘要 <p>There is disclosed a method for producing a highly cross-linked polypropylene material by plasma polymerisation of a carbon containing gas, not specifically propylene, exhibiting low relative permittivity, high thermal stability and enhanced mechanical properties, said method and material being suitable for application not limited to interlayer dielectric deposition in microchip fabrication.</p>
申请公布号 WO2010119263(A1) 申请公布日期 2010.10.21
申请号 WO2010GB00772 申请日期 2010.04.16
申请人 SURREY NANOSYSTEMS LIMITED;SILVA, SEMBUKUTTIARACHILAGE, RAVI, PRADIP;ESTEFANIA, JOSE, VIRGILIO, ANGUITA, RODRIGUEZ 发明人 SILVA, SEMBUKUTTIARACHILAGE, RAVI, PRADIP;ESTEFANIA, JOSE, VIRGILIO, ANGUITA, RODRIGUEZ
分类号 C08F2/48;B05D7/24;B29C59/14;C08F2/52;C08F2/54;C08J3/24;C08J3/28;C23C16/00 主分类号 C08F2/48
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