发明名称 METHOD OF DETERMINING DEFECT SIZE OF PATTERN USED TO EVALUATE DEFECT DETECTION SENSITIVITY AND METHOD OF CREATING SENSITIVITY TABLE
摘要 A defect size determining method measures a dimension A2 of a reference pattern 11s, a dimension B2 of an adjacent pattern 12s formed adjacent the reference pattern 11s, a dimension A1 of an evaluation pattern 11, and a dimension B1 of an adjacent pattern 12 formed adjacent the evaluation pattern 11, where the design value of the dimension A1 of the evaluation pattern 11 differs from the design value of the dimension A2 of the reference pattern 11s by a predetermined amount. The method then multiplies the measured value of the dimension A1 of the evaluation pattern 11 by the ratio of the measured value of the dimension B2 to the measured value of the dimension B1 and calculates the difference between the resulting value and the measured value of the dimension A2 of the reference pattern 11s to determine the defect size of the evaluation pattern 11.
申请公布号 US2010266194(A1) 申请公布日期 2010.10.21
申请号 US20100756369 申请日期 2010.04.08
申请人 NUFLARE TECHNOLOGY, INC. 发明人 MATSUNO YOSHIYUKI;MUSASHI NORIAKI
分类号 G06K9/62;G06F17/30 主分类号 G06K9/62
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