PLASMA IMPLANTATION SYSTEM WITH TARGET MOVEMENT

摘要

PURPOSE: A targeting type plasma injector is provided to prevent the excessive injection of an ion by preventing the ion from being injected into a wafer except for a target. CONSTITUTION: A wafer drive part(120) is included inside a chamber(110). The wafer drive part sequentially drives a loaded wafer(W) to a target location. A plasma generation part(130) is included in one side of the wafer drive part. The plasma generation part generates and transfers plasma into a target wafer. A shielding part(140) shields the remaining area except for the target wafer where an ion is inserted. The shielding part comprises a protrusion member(144) in order to protect the target wafer.