EXHAUST UNIT OF PLASMA PROCESSING APPARATUS AND EXHAUST METHOD THEREOF

摘要

PURPOSE: An exhaust unit of a plasma processing device and a ventilation method thereof are provided to improve process uniformity by preventing a plasma yaw phenomenon during a fabrication processing process. CONSTITUTION: An exhaust line(116) is connected to an exhaust pipe(114) which is formed in the bottom side of a chamber. The exhaust line converts the inside of the chamber(110) into a vacuum state by executing a center pumping process. A valve(116a), which connects or disconnects the inside of the chamber to a second buffer space part(132), is included in the exhaust line. An APC(Automatic Pressure Control) valve(120) is connected to one side of the chamber. A TMP(Turbo Molecular Pump)(130) is connected to the different end of the exhaust line and the APC valve.