PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE-RESIN TRANSFER FILM, RESIN PATTERN, METHOD FOR MANUFACTURING RESIN PATTERN, BASE BOARD FOR LIQUID CRYSTAL DISPLAY, AND LIQUID CRYSTAL DISPLAY

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition for manufacturing a resin pattern which endures an oscillation of high frequency.

SOLUTION: The photosensitive composition contains: a resin (A) whose side chain includes an acid group; a polymer compound (B) which contains at least a dipentaerythritol acrylate compound B1 and a tripentaerythritol acrylate compound B2; and a photopolymerization initiator (C) at a minimum. In this case, the respective content ratios W1 and W2 of the compound B1 and compound B2 to the total amount of the polymer compound (B) simultaneously satisfy the followings: an equation (1) 0.6≤W2/W1≤3.0 and an equation (2) 63%≤W1+W2≤100%.

COPYRIGHT: (C)2011,JPO&INPIT