| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide photomask blanks, curing with high sensitivity on exposure even if it includes a large amount of light shielding material and having excellent storage stability, and a photomask, produced using the photomask blanks, enabling image formation with high resolution and having high solvent resistance and high film strength. <P>SOLUTION: The photomask blanks have on a substrate a photosensitive composition layer containing (A) a sensitizing coloring matter, (B) a polymerization initiator, (C) a heterocyclic compound having two or more ethylenically unsaturated bonds, (D) a binder polymer, and (E) a light blocking material. The photomask is produced using the photomask blanks. <P>COPYRIGHT: (C)2011,JPO&INPIT |
