发明名称 SEMICONDUCTOR THIN FILM SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR CRYSTAL THIN FILM
摘要 PROBLEM TO BE SOLVED: To prevent protrusions from being formed on the surface of a crystal thin film during crystallizing an amorphous thin film by melt heating. SOLUTION: During crystallization by the melt heating, a buffer layer 3 buffering the volume change of the amorphous thin film 4 when crystallized by being melt at least its surface side and solidified is provided below the thin film 4. By merely adding one simple step of forming the buffer layer, the height of protrusions of the crystallized thin film can be sufficiently low in crystallization, resulting in a sufficiently thin insulating film. Furthermore, it is not necessary to introduce useless steps of such as polishing and etching when the protrusions are formed, thereby, enabling to achieve effects of such as prevention of the occurrence of contamination, improvement of the yield, and improvement of manufacturing efficiency. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010238897(A) 申请公布日期 2010.10.21
申请号 JP20090084972 申请日期 2009.03.31
申请人 JAPAN STEEL WORKS LTD:THE 发明人 TAKAHASHI MASASHI;EBISAWA TAKASHI
分类号 H01L21/20;H01L21/336;H01L29/786 主分类号 H01L21/20
代理机构 代理人
主权项
地址