发明名称 DOUBLE SIDE PATTERNING METHOD AND DOUBLE SIDE PATTERNING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To prevent patterns which are aligned with each other on both sides of a glass substrate, from being displaced due to heat shrinkage of the glass substrate when formed. <P>SOLUTION: Negative patterns obtained by inverting positive patterns to be formed finally are formed in alignment on both sides of the glass substrate at a temperature lower than the temperature at which the glass substrate shrinks. On each side of the glass substrate, a material for the positive patterns are deposited at a temperature higher than the temperature at which the glass substrate shrinks so as to cover the negative patterns. The negative patterns are peeled to form the aligned positive patterns on each side of the glass substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010237252(A) 申请公布日期 2010.10.21
申请号 JP20090081946 申请日期 2009.03.30
申请人 FUJIFILM CORP 发明人 YOKOYAMA IWAO;HIROSE NORIYOSHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址