摘要 |
A tungsten-containing mesoporous silica thin film, which is a mesoporous silica thin film formed from a solution containing a silica precursor and a water-soluble tungsten compound, and has a molar ratio (W/Si) of tungsten content to silicon content of 0.001 to 0.04, a film thickness of 0.1 to 5 μm, and an average pore diameter of 20 nm or less.
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