| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask blank which is hardened with high sensitivity by exposure to light even when containing a large quantity of a light shielding material and is superior in storage stability and safelight aptitude, and a photomask which is manufactured by using the photomask blank and allows an image to be formed with high resolution and has high linearity of image edge parts. <P>SOLUTION: The photomask blank has, on a substrate, a photosensitive composition layer containing a sensitizing dye (A) expressed by general formula (1), a polymerization initiator (B), a compound (C) having an ethylenically unsaturated bond, a binder polymer (D), and a light shielding material (E). In general formula (1): A represents an S atom or NR<SP>7</SP>; Y represents a non-metallic atomic group which forms a basic nuclear of dye in cooperation with an adjacent A and a carbon atom; R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>, R<SP>4</SP>, R<SP>5</SP>, and R<SP>6</SP>each independently represent a hydrogen atom, or a monovalent group comprising non-metallic atoms; and R<SP>7</SP>represents an alkyl group or an aryl group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
