发明名称 |
METHOD FOR PRODUCING METAL NITRIDE FILM, METAL OXIDE FILM, METAL CARBIDE FILM OR FILM OF COMPOSITE MATERIAL THEREOF, AND PRODUCTION APPARATUS THEREFOR |
摘要 |
Disclosed is a production apparatus for producing on a substrate a film selected from the group consisting of a metal nitride film, a metal oxide film, a metal carbide film and a film of composite material thereof. The production apparatus comprises a substrate holder for supporting the substrate; a chamber capable retaining a reduced pressure therein; an inert gas supply section that supplies inert gas into the chamber; a source gas supply section that supplies a source gas containing atoms selected from the group consisting of nitrogen atoms, oxygen atoms and carbon atoms into the chamber; a target containing a constituent element of a metal film to be formed on the substrate; a pair of sputtering electrodes for sputtering the target using the inert gas supplied from the gas supply section as a sputtering gas; and a metal catalyst which generates radicals by activating the source gas and which is placed outside a plasma region formed by the pair of sputtering electrodes.
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申请公布号 |
US2010264023(A1) |
申请公布日期 |
2010.10.21 |
申请号 |
US20100767403 |
申请日期 |
2010.04.26 |
申请人 |
NATIONAL UNIVERSITY CORPORATION KITAMI INSTUTUTE OF TECHNOLOGY |
发明人 |
TAKEYAMA MAYUMI;NOYA ATSUSHI |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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