| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photosensitive curable composition which gives a coating film excellent in transparency, heat resistance and light resistance and is suitable for a resist material. <P>SOLUTION: The curable composition comprises (A) a basic compound, (B) a photo acid generator, and (C) a modified polyorganosiloxane having at least two SiH groups in one molecule. Its cured product is also provided. <P>COPYRIGHT: (C)2011,JPO&INPIT |
