发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: A substrate processing apparatus having a connecting member interlinked a plurality of supporting members is provided to realize the substrate processing apparatus while maintaining the thermion on the substrate. CONSTITUTION: A plate member is horizontally arranged on a surface. The plate member enforces the thermal process for the substrate. The predetermined external diameter for mounting the substrate in which a plurality of wires(54) is arranged in the surface of the plate member is had. The apparatus for adjusting tension regularly supports the tension of a plurality of wires.
申请公布号 KR20100113472(A) 申请公布日期 2010.10.21
申请号 KR20100098880 申请日期 2010.10.11
申请人 TOKYO ELECTRON LIMITED 发明人 SAKAI MITSUHIRO;IKEDA KATSUHIRO
分类号 G02F1/13;H01L21/00;H01L21/683 主分类号 G02F1/13
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