| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition as a chemically amplified resist that is excellent in depth of focus, LWR (Line Width Roughness), and MEEF (Mask Error Enhancement Factor), and excellent also in preventing the occurrence of a defect in development. <P>SOLUTION: The radiation sensitive resin composition contains (A) polymer containing two types of specific repeating units, (B) a radiation sensitive acid generator, and (C) compound having a specific ammonium structure. <P>COPYRIGHT: (C)2011,JPO&INPIT |
