CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION, POLYMER USED FOR THE COMPOSITION, AND COMPOUND DERIVING STRUCTURE UNIT OF THE POLYMER

摘要

PROBLEM TO BE SOLVED: To provide a compound for preparing a chemically amplified positive photoresist composition to give patterns having high resolution and good pattern profile.

SOLUTION: A compound represented by the formula (I) (wherein R1is hydrogen, fluorine, 1-4C linear or branched chain alkyl which may be substituted by fluorine; R2and R3are each independently hydrogen or 1-4C linear or branched chain alkyl; R4is 1-8C divalent hydrocarbon group; R5is a single bond, 1-4C divalent hydrocarbon group or carbonyl; and R6is a 6-20C aromatic hydrocarbon group which may have a substituent).

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