ORGANIC PHOTORESIST STRIPPER COMPOSITION

摘要

The present invention relates to aphotoresist stripper composition, comprising a polar organic solvent, a basic primary or secondary alkanolamine compound or a combination thereof, a tertiaryaminecompound, and an inhibitor for preventing metal etching. The composition can further containan organic acid. The composition can effectively strip a photoresist film remaining on a substrate after an etching process without causing corrosions to substrate surfaces and metal surfaces, and also can remove oxides fromthe metal surfaces during a manufacturing process of a semiconductor including a large-scale integrated circuit or a very-large-scale integrated circuit.The present invention also relates to a process for stripping a photoresist film on a substrate using the composition.