SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a silicon-containing film-forming composition with which a silicon-containing film excellent in storage stability and adhesion to a resist film can be formed and a resist pattern excellent in bottom shape without tailing can be stably formed.

SOLUTION: The silicon-containing film-forming composition includes a polysiloxane and an organic solvent containing a structural unit (a1) of tetraalkoxysilane, a structural unit (a2) as in a formula (1), and a structural unit (a3) as in a formula (2). In the formula (1), R1indicates independently a hydrogen atom or an electron-donating group. At least one R1is an electron-donating group. R2represents a monovalent organic group. n represents 0 or 1. In the formula (2), R3represents a 1-8C alkyl group. R4represents a monovalent organic group.

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