发明名称 EXPOSURE APPARATUS AND QUANTITY OF LIGHT CORRECTION METHOD OF EXPOSURE APPARATUS AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To suppress the generation of brightness unevenness while inhibiting the progress of the time deterioration of an organic EL element. <P>SOLUTION: Each lighting circuit 51(i) (i=1-m) is composed of a plurality of pixels, and each pixel is provided with a plurality of organic EL elements. An exposure apparatus makes each organic EL element emit light periodically by a drive signal of a fixed value after power is turned on or in a non-printing state before or after printing, for example, and measures the quantity of light emitted from the organic EL element by the optical sensor circuit 52(i) (i=1-m). A sensor driver 45 outputs a sensor output signal corresponding to the measured quantity of emitted light to a head controller. The head controller corrects a gradation signal according to image data based on a difference between the measured quantity of emitted light and a set reference quantity of light, and corrects an anode time for causing each organic EL element to emit light based on a difference between a set target reference quantity of light and a set reference quantity of light. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010234782(A) 申请公布日期 2010.10.21
申请号 JP20090088414 申请日期 2009.03.31
申请人 CASIO COMPUTER CO LTD 发明人 KOBAYASHI KENJI;MATSUOKA YOSHIYUKI;EBISAWA ISAO
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/04;G03G15/043;G03G21/00;G03G21/14;H04N1/036 主分类号 B41J2/44
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