| 摘要 |
A clear cleansing composition that also provides excellent moisturization is described. The composition comprises about 0.05 to about 30 weight percent anionic surfactant, an additional surfactant selected from about 0.5 to about 20 weight percent amphoteric surfactant, about 0.1 to about 20 weight percent nonionic surfactant, or both, and about 0.1 to about 50 weight percent humectant. Advantageously, the composition is also mild.
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