| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that can suppress or avoid an increase in substrate transport time even when a plurality of substrate processing sections are arranged along a transport passage, and to provide a substrate transport method. SOLUTION: The substrate processing apparatus 1 includes a plurality of processing units 6, a shuttle ST, a main robot MR, an MR moving mechanism 7, and a shuttle moving mechanism. The plurality of processing units 6 are configured to process substrates W one by one, and arranged along a transport passage C1. The shutter ST is configured to put a substrate W in a standby state, and provided movably along the transport passage C1. The main robot MR is configured to transport the substrate W between the shuttle ST and each of the processing units 6, and provided movably along the transport passage C1. The shuttle moving mechanism moves the shuttle ST along the transport passage C1. Further, the MR moving mechanism 7 moves the main robot MR along the transport passage C1. COPYRIGHT: (C)2011,JPO&INPIT |
