| 摘要 |
An exposure apparatus comprises an exposure device configured to perform an exposure process for a substrate, and a controller configured to control an operation of the exposure device in accordance with control software and perform an update process for the control software. The controller is configured to queue an exposure job corresponding to the exposure process and an update job corresponding to the update process; and cause the exposure device to perform an exposure process corresponding to the queued exposure job if the queued exposure job is output, and perform an update process corresponding to the queued update job if the queued update job is output.
|
