发明名称 |
METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATE |
摘要 |
An apparatus and method of growing a thin film onto a substrate comprises placing a substrate in a reaction chamber and subjecting the substrate to surface reactions of a plurality of vapor-phase reactants according to the ALD method. Non-fully closing valves are placed into the reactant feed conduit and backsuction conduit of an ALD system. The non-fully closed valves are operated such that one valve is open and the other valve is closed during the purge or pulse cycle of the ALD process.
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申请公布号 |
US2010266765(A1) |
申请公布日期 |
2010.10.21 |
申请号 |
US20090427690 |
申请日期 |
2009.04.21 |
申请人 |
WHITE CARL L;SHERO ERIC J |
发明人 |
WHITE CARL L.;SHERO ERIC J. |
分类号 |
C23C16/44;C23C16/54 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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