发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING COLOR FILTER, AND COLOR DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high definition and good adhesion and being free from development residues, and to provide a method for manufacturing a color filter having a photo spacer using the photosensitive resin composition, and a color display device. <P>SOLUTION: The photosensitive resin composition contains an acrylic resin (A) having an ethylenically unsaturated group, a photopolymerizable compound (B), a photopolymerization initiator (C), an organic solvent (D), and a phosphoric ester (E) having an ethylenically unsaturated group, wherein the acrylic resin (A) is a polymer which has a weight average molecular weight of 3,000 to 200,000 and carried out addition of 1-30 mass% of an ethylenically unsaturated group-containing isocyanate expressed by general formula (1), to a polymer (a) obtained by polymerization of a monomer component containing 3 to 70 mass% of a monomer having a dicyclo ring or a tricyclo ring, 5 to 50 mass% of a monomer having an hydroxyl group, and 5 to 50 mass% of a monomer having an N-substituted maleimide group. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010237449(A) 申请公布日期 2010.10.21
申请号 JP20090085518 申请日期 2009.03.31
申请人 HITACHI CHEM CO LTD 发明人 TOMOMATSU MEGUMI;KIMURA YOICHI;HARUHARA SEIJI;WADA MASAYUKI
分类号 G03F7/038;C08F8/30;C08F290/12;G02B5/20;G02B5/22;G02F1/1335;G02F1/1339;G03F7/004 主分类号 G03F7/038
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