| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a Novolak type phenol resin which has excellent heat resistance, further is highly sensitive, and is not inferior to a Novolak type phenol resin for general purpose also in other characteristics, and to provide a resin composition for a photoresist. <P>SOLUTION: The Novolak type phenol resin is obtained by making phenols and aldehydes react with each other in the presence of an acidic catalyst, wherein the chemical composition of the phenols is composed of 50-89 wt.% of meta-cresol, and 10-49 wt.% of para-cresol, and the aldehydes are aromatic dialdehydes such as phthalaldehyde. <P>COPYRIGHT: (C)2011,JPO&INPIT |
