| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a multi-gradation photomask that can have two kinds of translucent film and a light shield film optionally combined. <P>SOLUTION: The method of manufacturing the multi-gradation photomask includes the processes of: forming a first resist pattern on a light shield film of a photomask blank; etching the light shield film for first patterning; forming a first translucent film on the entire surface of a substrate and forming a second resist pattern after removing the first resist pattern; etching at least the first translucent film for second patterning; forming a second translucent film on the entire surface of the substrate and forming a third resist pattern after removing the second resist pattern; and etching at least the second translucent film for third patterning. In the method of manufacturing the multi-gradation photomask, the resist pattern is left at a light shield part during the formation of the first resist pattern, and the size of the resist pattern at the light shield part is made a predetermined margin region larger at the border between a light transmission part adjacent to the light shield part and a first translucent part. <P>COPYRIGHT: (C)2011,JPO&INPIT |
