| 摘要 |
PURPOSE: An exhaust device and a substrate processing device are provided to prevent foreign materials from being deposited on a bellows valve by including a cover for the bellow valve. CONSTITUTION: A processing unit(100) processes a substrate and includes a housing(110), first and second chucks(120a,120b), a sealing cover(140), and first and second shower heads(150a,150b). The process chamber provides a space for an ashing process. A plasma generator(200) generates plasma for processing the substrate and supplies the plasma to the processing unit. An exhaust unit(300) exhausts the reactive by-product and the gas from the processing unit to the outside.
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