Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid crystal display device,申请号EP20080013249-传众专利搜索

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发明名称	Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid crystal display device
摘要
申请公布号	EP2023203(B1)	申请公布日期	2010.10.20
申请号	EP20080013249	申请日期	2008.07.23
申请人	FUJIFILM CORPORATION	发明人	NAKAMURA, HIDEYUKI;MOCHIZUKI, KYOHEI;FUKUSHIGE, YUUICHI;ARIOKA, DAISUKE
分类号	G03F7/033;G03F7/038	主分类号	G03F7/033
代理机构		代理人
主权项
地址

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