发明名称 VERTICAL FIELD TRANSISTOR
摘要 FIELD: electricity. ^ SUBSTANCE: in vertical field transistor containing the source connection, ohmic contact to the source, source, vertical conducting channels, gate made in the form of metal band, sink, the first and the second dielectric layers located on upper and lower surfaces of metal band and adjacent to side surfaces of vertical conducting channels, and substrate, to lower sink surface there in series applied is layer of ohmic contact, contact layer of ductile metal and damping layer of ductile metal, to lower surface of non-perforated end of metal band there in series applied is the first process layer, the second process layer and support for non-perforated end of metal band; substrate is made from heat-conducting dielectric material; to upper side of substrate there applied are the first and the second contact platforms which are galvanically connected to lower surfaces of damping layer and metal support, and all the transistor elements arranged on dielectric substrate, except the source connection, are enveloped with protective dielectric filling. ^ EFFECT: invention allows increasing output power of transistor and improving reliability and its life time. ^ 8 cl, 3 dwg
申请公布号 RU2402105(C1) 申请公布日期 2010.10.20
申请号 RU20090129899 申请日期 2009.08.03
申请人 ZAKRYTOE AKTSIONERNOE OBSHCHESTVO "NAUCHNO-PROIZVODSTVENNAJA FIRMA MIKRAN" 发明人 SEMENOV ANATOLIJ VASIL'EVICH;KHAN ALEKSANDR VLADIMIROVICH;KHAN VLADIMIR ALEKSANDROVICH
分类号 H01L29/772 主分类号 H01L29/772
代理机构 代理人
主权项
地址