发明名称 METHOD FOR RECYCLING SIC FROM THE WASTE-SLURRY PRODUCED IN THE MANUFACTURING PROCESS OF SEMICONDUCTOR-WAFER AND THERE APPARATUS
摘要 PURPOSE: A method and a device thereof are provided to minimize the use of an alkali aqueous solution by washing only a slicing material after a centrifugal filtration process. CONSTITUTION: An alkali washing tank(22) mixes a centrifuge slicing material with an alkali aqueous solution and precipitates it. A water washing tank(23) mixes an alkali washing slicing material with washing water and precipitates it. A degreasing tank(21) mixes the slicing material with a degreasing agent aqueous solution and precipitates it. A transfer part transfers the alkali washing slicing material from the alkali washing tank to the water washing tank.
申请公布号 KR20100112921(A) 申请公布日期 2010.10.20
申请号 KR20090031458 申请日期 2009.04.10
申请人 CHANG, YOUNG CHUL 发明人 CHANG, YOUNG CHUL
分类号 H01L21/02;H01L21/301 主分类号 H01L21/02
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