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发明名称
SEMICONDUCTOR ABRASIVE, PROCESS FOR PRODUCING THE SAME AND METHOD OF POLISHING
摘要
申请公布号
KR100988749(B1)
申请公布日期
2010.10.20
申请号
KR20057001056
申请日期
2003.07.22
申请人
发明人
分类号
H01L21/304;B24B37/00;B24D3/02;C09G1/02;H01L21/3105;H01L21/321;H05K3/26
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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