发明名称 Sample holder and ion-beam processing system
摘要 <p>Sample holder (8) and ion-beam processing system are offered which permit a good sample (7) adapted for observation (such as TEM (transmission electron microscopy) observation). The sample holder has a sample placement portion (9) having a sample stuck surface (10). The holder further includes a shielding material guide portion (12) placed over the sample placement portion. The guide portion is fixedly mounted to the sample placement portion and has a shielding material guide surface (13). The sample stuck surface is in a position rearward to the position of the shielding material guide surface by a given amount of 40 µm. Therefore, when the sample having a thickness of 100 µm is attached to the sample stuck surface, the sample protrudes 60 µm ahead of the shielding material guide surface. The shielding material (16) having a thickness of about 20 µm is then placed in position over the shielding material guide surface. </p>
申请公布号 EP1684327(A3) 申请公布日期 2010.10.20
申请号 EP20060250314 申请日期 2006.01.20
申请人 JEOL LTD. 发明人 YAMASHITA, TAKUSHI
分类号 H01J37/20;G01N1/28;H01J37/305 主分类号 H01J37/20
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