发明名称 METHOD FOR PRODUCING A MICROSTRUCTURE
摘要 The present invention relates to a method for producing a micropattern on a substrate (22), in which a substrate (22) is provided with a relief pattern (26, 28) that exhibits elevations (26) and depressions (28), and in which the elevations (26) and/or depressions (26) are arranged in the form of the desired micropattern, and with a printing tool, an imprint material (30; 34) is transferred to the relief pattern (26, 28), the viscosity of the imprint material (30; 34) being chosen such that the imprint material (30; 34) is selectively transferred either substantially only onto the elevations (26) or substantially only into the depressions (28) of the relief pattern.
申请公布号 EP2240330(A2) 申请公布日期 2010.10.20
申请号 EP20080866269 申请日期 2008.12.17
申请人 GIESECKE & DEVRIENT GMBH 发明人 HOFFMUELLER, WINFRIED;BURCHARD, THEODOR;DICHTL, MARIUS;RENNER, PATRICK;RAHM, MICHAEL;HEIM, MANFRED;HOFFMANN, LARS;DOTZLER, MANFRED;LIEBLER, RALF;KELLER, MARIO
分类号 B41M1/04;B41M1/10;B41M3/14;B41M7/00;B42D15/10;B81C99/00 主分类号 B41M1/04
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