发明名称 |
METHOD FOR PRODUCING A MICROSTRUCTURE |
摘要 |
The present invention relates to a method for producing a micropattern on a substrate (22), in which a substrate (22) is provided with a relief pattern (26, 28) that exhibits elevations (26) and depressions (28), and in which the elevations (26) and/or depressions (26) are arranged in the form of the desired micropattern, and with a printing tool, an imprint material (30; 34) is transferred to the relief pattern (26, 28), the viscosity of the imprint material (30; 34) being chosen such that the imprint material (30; 34) is selectively transferred either substantially only onto the elevations (26) or substantially only into the depressions (28) of the relief pattern. |
申请公布号 |
EP2240330(A2) |
申请公布日期 |
2010.10.20 |
申请号 |
EP20080866269 |
申请日期 |
2008.12.17 |
申请人 |
GIESECKE & DEVRIENT GMBH |
发明人 |
HOFFMUELLER, WINFRIED;BURCHARD, THEODOR;DICHTL, MARIUS;RENNER, PATRICK;RAHM, MICHAEL;HEIM, MANFRED;HOFFMANN, LARS;DOTZLER, MANFRED;LIEBLER, RALF;KELLER, MARIO |
分类号 |
B41M1/04;B41M1/10;B41M3/14;B41M7/00;B42D15/10;B81C99/00 |
主分类号 |
B41M1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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