发明名称 DEPOSITION PROCESS
摘要 <p>A deposition process includes placing a substratum to be covered in a deposition environment in which the deposition pressure is lower that the atmospheric pressure. The substratum to be covered is purified. A coating of metal material is applied in a nebulized state onto the substratum to be covered, so as to obtain a covered substratum.</p>
申请公布号 EP2240625(A1) 申请公布日期 2010.10.20
申请号 EP20080866174 申请日期 2008.12.18
申请人 GIRARDELLO, GIANPAOLO 发明人 GIRARDELLO, GIANPAOLO
分类号 C23C14/02;C23C14/20 主分类号 C23C14/02
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