发明名称 FILM FORMING APPARATUS, FILM FORMING METHOD, AND STORAGE MEDIUM
摘要 PURPOSE: A film forming apparatus, a film forming method, and a storage medium are provided to form a thin film by sequentially supplying two kinds of reaction gases to the surface of a substrate. CONSTITUTION: A turn table(2) has a rotation shaft in a vacuum container(1). The vacuum container comprises a body(12) of a cup type and a ceiling panel(11) of a disc shape. The turn table is fixed to a core unit of a cylindrical shape. The core unit is fixed to the upper part of a rotation shaft. The rotation shaft and a driving unit are received into a cylindrical case.
申请公布号 KR20100112532(A) 申请公布日期 2010.10.19
申请号 KR20100032179 申请日期 2010.04.08
申请人 TOKYO ELECTRON LIMITED 发明人 KATO HITOSHI;HONMA MANABU;KIKUCHI HIROYUKI
分类号 H01L21/203;H01L21/205;H01L21/31 主分类号 H01L21/203
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