发明名称 |
FILM FORMING APPARATUS, FILM FORMING METHOD, AND STORAGE MEDIUM |
摘要 |
PURPOSE: A film forming apparatus, a film forming method, and a storage medium are provided to form a thin film by sequentially supplying two kinds of reaction gases to the surface of a substrate. CONSTITUTION: A turn table(2) has a rotation shaft in a vacuum container(1). The vacuum container comprises a body(12) of a cup type and a ceiling panel(11) of a disc shape. The turn table is fixed to a core unit of a cylindrical shape. The core unit is fixed to the upper part of a rotation shaft. The rotation shaft and a driving unit are received into a cylindrical case. |
申请公布号 |
KR20100112532(A) |
申请公布日期 |
2010.10.19 |
申请号 |
KR20100032179 |
申请日期 |
2010.04.08 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KATO HITOSHI;HONMA MANABU;KIKUCHI HIROYUKI |
分类号 |
H01L21/203;H01L21/205;H01L21/31 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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