发明名称 Wafer
摘要 A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.
申请公布号 US7816013(B2) 申请公布日期 2010.10.19
申请号 US20080326310 申请日期 2008.12.02
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 TSUKATANI TOSHIHIKO;KONYA MASARU;HAMAYA NORIAKI;NAKANO HAJIME;MAEDA TAKAO
分类号 B32B9/04;B32B9/06;B32B13/04 主分类号 B32B9/04
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