发明名称 Nano-elastic memory device and method of manufacturing the same
摘要 A nano-elastic memory device and a method of manufacturing the same. The nano-elastic memory device may include a substrate, a plurality of lower electrodes arranged in parallel on the substrate, a support unit formed of an insulating material to a desired or predetermined thickness on the substrate having cavities that expose the lower electrodes, a nano-elastic body extending perpendicular from a surface of the lower electrodes in the cavities, and a plurality of upper electrodes formed on the support unit and perpendicularly crossing the lower electrodes over the nano-elastic bodies.
申请公布号 US7816175(B2) 申请公布日期 2010.10.19
申请号 US20080289192 申请日期 2008.10.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHANG JOO-HAN;KANG DONG-HUN;CHA YOUNG-KWAN;PARK WAN-JUN
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
主权项
地址