| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target which increases deposition speed by enhancing PTF of the target having low PTF and reduced leakage magnetic flux, enables the use of a thick target and can improve productivity. SOLUTION: In the target used for a magnetron sputtering apparatus, a backing plate 12 made of a CoCr alloy that is a material having a flux permeability higher than that of the target plate 11 is joined to a side opposite to the sputtering surface of the target plate 11 composed of Co base sintering alloy containing Cr and Pt. COPYRIGHT: (C)2011,JPO&INPIT
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